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Chronoamperometric study of the passive behaviour of tantalum in hostile media during water additionTROMPETTE, J. L; MASSOT, L.Corrosion science. 2012, Vol 57, pp 174-181, issn 0010-938X, 8 p.Article

The dissolution behavior of Nb₂O₅, Ta₂O₅ and their mixture in highly concentrated KOH solutionZHOU, Hong-Ming; YI, Dan-Qing; YI ZHANG et al.Hydrometallurgy (Amsterdam). 2005, Vol 80, Num 1-2, pp 126-131, issn 0304-386X, 6 p.Article

Antibacterial properties and cytocompatibility of tantalum oxide coatingsCHANG, Yin-Yu; HUANG, Heng-Li; CHEN, Hung-Jui et al.Surface & coatings technology. 2014, Vol 259, pp 193-198, issn 0257-8972, 6 p., bConference Paper

Properties of pulsed reactive DC magnetron sputtered tantalum oxide (Ta₂O₅) thin films for photocatalysisJAGADEESH KUMAR, K; RAVI CHANDRA RAJU, N; SUBRAHMANYAM, A et al.Surface & coatings technology. 2011, Vol 205, issn 0257-8972, S261-S264, SUP2Conference Paper

Kinetics of nanoscale structure development during Mg-vapour reduction of tantalum oxideMÜLLER, R; BOBETH, M; BRUMM, H et al.International journal of materials research. 2007, Vol 98, Num 11, pp 1138-1145, issn 1862-5282, 8 p.Article

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Quantitative Erfassung des Ionenstrahleinflusses beim Sputtering von Oxidschichten mit AES und XPS = Détermination quantitative de l'influence du jet d'ions dans la pulvérisation de couches d'oxyde par SPA et SPX = Quantitative evaluation of the ion-beam effect during sputtering of oxide layers using AES and XPSHOFMANN, S; SANZ, J.M.Fresenius' Zeitschrift für analytische Chemie. 1983, Vol 314, Num 3, pp 215-219, issn 0016-1152Article

Chromium and tantalum oxide nanocoatings prepared by filtered cathodic arc deposition for corrosion protection of carbon steelDIAZ, Belén; SWIATOWSKA, Jolanta; MAURICE, Vincent et al.Surface & coatings technology. 2012, Vol 206, Num 19-20, pp 3903-3910, issn 0257-8972, 8 p.Article

Effect of a silicon nitride buffer layer on the electrical properties of tantalum pentoxide filmsWANG, B. Y; HAO WANG; YE, C et al.Microelectronic engineering. 2010, Vol 87, Num 4, pp 597-600, issn 0167-9317, 4 p.Article

Kinetics of chlorination of tantalum pentoxide in mixture with sucrose carbon by chlorine gasGONZALEZ, J. A; RIVAROLA, J. B; RUIZ, M. Del C et al.Metallurgical and materials transactions. B, Process metallurgy and materials processing science. 2004, Vol 35, Num 3, pp 439-448, issn 1073-5615, 10 p.Article

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Pulsed ruby laser-induced aqueous oxidation of tantalum: X-ray diffraction and x-ray photoelectron spectroscopic study = Oxydation aqueuse du tantale induite par laser pulsé: étude par spectroscopie photoélectronique RX et diffraction des RXGHAISAS, S. V; MALSHE, A. P; PATIL, P. P et al.Journal of applied physics. 1987, Vol 62, Num 7, pp 2799-2802, issn 0021-8979Article

The coefficient of thermal expansion of a super invar-Ta₁₆W₁₈O₉₄ composite = Die Waermeausdehnungskoeffizienten von Super Invar - Ta₁₆W₁₈O₉₄ - VerbundwerkstoffenCHU, S.N; SAKA, N; SUH, N.P et al.Journal of engineering materials and technology. 1986, Vol 108, Num 3, pp 270-274, issn 0094-4289Article

Electrochromic switchable mirror foil with tantalum oxide thin film prepared by reactive DC magnetron sputtering in hydrogen-containing gasTAJIMA, Kazuki; HOTTA, Hiromi; YAMADA, Yasusei et al.Surface & coatings technology. 2011, Vol 205, Num 15, pp 3956-3960, issn 0257-8972, 5 p.Article

Oxide nanolayer improving RRAM operational performanceSHIMA, Hisashi; TAMAI, Yukio.Microelectronics journal. 2009, Vol 40, Num 3, pp 628-632, issn 0959-8324, 5 p.Conference Paper

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Study on corrosion properties of sputter coating of oxides on stainless steelsHAYASHI, Y; MASUDA, M; LEE, J et al.Materials science & engineering. A, Structural materials : properties, microstructure and processing. 1995, Vol 198, Num 1-2, pp 71-74, issn 0921-5093Conference Paper

Comparative in situ study of tantalum thin film oxidation in isothermal and nonisothermal conditions = Etude comparative in situ de l'oxydation de couches minces de tantale en conditions isothermes et non isothermesLUGOMER, S; KERENOVIC, M; STIPANICIC, M et al.Vacuum. 1988, Vol 38, Num 1, pp 15-19, issn 0042-207XArticle

Chemical state depth profiles from SIMS ion energy distributions using factor analysis = Profils de profondeur de l'état chimique à partir des distributions des énergies des ions SIMS en utilisant l'analyse factorielleSOLOMON, J. S.Surface and interface analysis. 1987, Vol 10, Num 4, pp 216-218, issn 0142-2421Article

Growth of Ta-oxide on thin tantalum films containing grain boundary particles = Croissance des oxydes de Ta sur des couches minces de tantale contenant des particules aux joints de grainsLUGOMER, S; STIPANCIC, M; KERENOVIC, M et al.Vacuum. 1987, Vol 37, Num 1-2, pp 89-91, issn 0042-207XConference Paper

Ta_xHf_1-xB₂-SiC multiphase oxidation protective coating for SiC-coated carbon/carbon compositesXUANRU REN; HEJUN LI; QIANGANG FU et al.Corrosion science. 2014, Vol 87, pp 479-488, issn 0010-938X, 10 p.Article